Si+BN薄膜
Si+BN薄膜,BN Film coated by sputtering method
货号 | 规格 | 数量 | 价格 |
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Q-0049536 | 100mg |
1
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询价 |
Q-0049536 | 250mg |
1
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Q-0049536 | 500mg |
1
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询价 |
Q-0049536 | 1g |
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询价 |
Q-0049536 | 5g |
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询价 |
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业务范围:AIE材料 | 荧光产品 | MOF产品 | 二维纳米 | 糖化学 | 凝集素 | PEG
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产品介绍
Boron nitride is a chemical compound with chemical formula BN, consisting of equal numbers of boron and nitrogen atoms. BN is isoelectronic to a similarly structured carbon lattice and thus exists in various crystalline forms. The Cubic (sphalerite structure) bariety analogous to diamond is called c-BN. Its hardness is inferior only to diamond, but its thermal and chemical stability is superior. Low-pressure deposition of thin films of boron nitride are grown on Si (100) wafers for this product.
· BN Film coated by sputtering method
· BN Thickness: 24 nm +/- 10%
· Conductive type: Si n- type
· Resistivity: 1- 10 ohm-cm
· Size: 4" diameter +/- 0.5 mm x 0.525 +/- 0.025 mmth
· Orientation: (100) +/- 0.5o
· Polish: One sides polished
· Surface roughness: Prime
· Packing: Vacuum packed on a 4" single wafer carrier box
参数信息 | |
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外观状态: | 固体或粉末 |
质量指标: | 95%+ |
溶解条件: | 有机溶剂/水 |
CAS号: | N/A |
分子量: | N/A |
储存条件: | -20℃避光保存 |
储存时间: | 1年 |
运输条件: | 室温2周 |
生产厂家: | 西安齐岳生物科技有限公司 |
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